Electrons in Lithography and Imaging for
Science and Application

16.-19. NOVEMBER 2026

STYKKISHÓLMUR, ICELAND

Programme Overview

Confirmed Contributions

Keynotes
Dr. John S. Villarrubia
National Institute of Standards and Technology, MD, USA
CV

From electron-solid interactions to quantitative SEMmetrology: testing the physics from yield to topography

Abstract
Prof. Stacey Bent
Stanford University, Stanford, CA, United States
CV

Molecular Design and Atomic-Scale Control: New Directions in EUV Photoresist Materials and Pattern Enhancement

Abstract
Prof. Timon Fliervoet
Technical University Delft and ASML-Research Veldhoven, The Netherlands
CV

Low-Energy Electrons: From Nanometer-Scale EUV Patterning to Metrology and Inspection

Abstract

FYRIR SÍMA VIEW

MUNA FYRIR ÞESSA UPPSETNINGU AÐ CONTAINER 1 OG 3 ERU SÝNILEGIR Á TÖLVU OG IPAD EN CONTAINER 2 OG 3 FYRIR SÍMA

Dr. John S. Villarrubia

National Institute of Standards and Technology

Dr. John S. Villarrubia

National Institute of Standards and Technology

Title: From electron-solid interactions to quantitative SEMmetrology: testing the physics from yield to topography

Abstract

Prof. Stacey Bent

Stanford University, Stanford, CA, United States

Prof. Stacey Bent

Stanford University, Stanford, CA, United States

Title: Molecular Design and Atomic-Scale Control: New Directions in EUV Photoresist Materials and Pattern Enhancement

Abstract

Prof. Dr. Timon Fliervoet

Technical University Delft and Advanced Semiconductor Materials Lithography (ASML) Veldhoven, The Netherlands

Prof. Dr. Timon Fliervoet

Technical University Delft and Advanced Semiconductor Materials Lithography (ASML) Veldhoven, The Netherlands

Title: Low-Energy Electrons: From Nanometer-Scale EUV Patterning to Metrology and Inspection

Abstract

Invited Speakers
Dr. Sven Christian Barth
Goethe University Frankfurt, Frankfurt, Germany
CV

From Molecule to Nanostructure by Direct-Write Nanofabrication: Fundamental Beam–Material Interactions and Precursor Design

Abstract
Dr. Jakub Mateusz Jurczyk
Technical University Vienna, Vienna, Austria
CV

3D nanoprinting with electrons: shape, composition and in-situ process analysis

Abstract
Dr. Eliška Mikmeková
Institute of Scientific Instruments of the Czech Academy of Science (ISI) Brno, Czech Republic
CV

Low-Energy Electron Microscopy of 2D Materials: From Graphene to Electron Microscopy Applications

Abstract
Prof. Philip D. Rack
University of Tennessee, Department of Material Science and Engineering, Knoxville TN, USA
CV

Focused Electron Beam Induced Etching of Superconducting and Semiconducting Materials and Devices

Abstract
Prof. Sense Jan van der Molen
Leiden University, Leiden, The Netherlands
CV

Investigating EUV resists with low-energy electrons

Abstract
Prof. Bo Da
University of Science and Technology of China, Hefei, P.R. China
CV

Correlated Electron-Matter Interactions: From Inelastic Scattering to Beam Focusing via Rotationally Structured Crystals

Abstract
Prof. Howard Fairbrother
Johns Hopkins University, Baltimore, Maryland, USA
CV

Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract
Dr. Mohamed Belhaj
Office National d’Études et de Recherches Aérospatiales, Toulouse, France
CV

Abstract

FYRIR SÍMA VIEW

MUNA FYRIR ÞESSA UPPSETNINGU AÐ CONTAINER 1 OG 3 ERU SÝNILEGIR Á TÖLVU OG IPAD EN CONTAINER 2 OG 3 FYRIR SÍMA

Dr. Sven Christian Barth

Goethe University Frankfurt, Frankfurt, Germany

Dr. Sven Christian Barth

Goethe University Frankfurt, Frankfurt, Germany

Title: From Molecule to Nanostructure by Direct-Write Nanofabrication: Fundamental Beam–Material Interactions and Precursor Design

Abstract

Dr. Jakub Mateusz Jurczyk

Technical University Vienna, Vienna, Austria

Dr. Jakub Mateusz Jurczyk

Technical University Vienna, Vienna, Austria

Title: 3D nanoprinting with electrons:shape, composition and in-situ process analysis

Abstract

Dr. Eliška Mikmeková

Institute of Scientific Instruments of the Czech Academy of Science (ISI) Brno, Czech Republic

Dr. Eliška Mikmeková

Institute of Scientific Instruments of the Czech Academy of Science (ISI) Brno, Czech Republic

Title: Low-Energy Electron Microscopy of 2D Materials: FromGraphene to Electron Microscopy Applications

Abstract

Prof. Philip D. Rack

University of Tennessee, Department of Materials Science and Engineering, Knoxville TN, USA

Prof. Philip D. Rack

University of Tennessee, Department of Materials Science and Engineering, Knoxville TN, USA

Title: Focused Electron Beam Induced Etching of Superconducting and Semiconducting Materials and Devices

Abstract

Prof. Sense Jan van der Molen

Leiden University, Leiden, The Netherlands

Prof. Sense Jan van der Molen

Leiden University, Leiden, The Netherlands

Title: Investigating EUV resists with low-energy electrons

Abstract

Prof. Bo Da

University of Science and Technology of China, Hefei, P.R.China

Prof. Bo Da

University of Science and Technology of China, Hefei, P.R.China

Title: Correlated Electron-Matter Interactions: From Inelastic Scattering to Beam Focusing via Rotationally Structured Crystals

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Dr. Mohamed Belhaj

Office National d'Études et de Recherches Aérospatiales, Toulouse, France

Dr. Mohamed Belhaj

Office National d'Études et de Recherches Aérospatiales, Toulouse, France

LAGA!!!Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Contributed Talks
Ms. Alix Tatiana Escalante-Quiceno
INMA (CSIC – Universidad de Zaragoza), Spain
Abstract

Focused Electron and Ion Beam Processing for High-Resolution AFM and MFM Probes

Dr. Adam Hrdý
Thermo Fisher Scientific, Brno, Czechia
Abstract

Chemistry Assisted Delayering of Advanced Semiconductor Devices Using MultiChem

Prof. Amalio Fernández-Pacheco
Institute of Applied Physics, TU Wien, Vienna, Austria
Abstract

Electron-beam 3D nanoprinting: open-source patterning and functional magnetic nanoarchitectures

Prof. Armin Gölzhäuser
Bielefeld University, Bielefeld, Germany
Abstract

Carbon Nanomembranes: Radiation-induced 2D Materials for Separation

Prof. David J. Lewis
Department of Chemistry, University of Manchester, U.K.
Abstract

E-Beam Lithography of Topological Insulators: Nanoscale Bismuth(III) Selenide Written Directly from a Single-Source Precursor

Dr. Fabian Holzmeier
IMEC, Leuven, Belgium
Abstract

More is not always better: Dissociative photoionization limits the EUV absorbing photoacid generator pentafluorophenyl triflate in photolithography

Mr. Giel T. B. Coemans
Delft University of Technology, The Netherlands
Abstract

Predicting SEM Charging Artefacts in Semiconductor Structures Using a Dynamic Charge Balance Model

Dr. Georghii Tchoudinov

School of Science and Technology, University of Camerino, Italy

CNR – Istituto Officina dei Materiali (IOM), Trieste, Italy
Abstract

Role of the electron Inelastic Mean Free Path in x-rayphotoemission and x-ray absorption spectroscopy of solid copper

Dr. Ivo Utke
Swiss Federal Laboratories for Materials Science and Technology (EMPA), Thun, Switzerland
Abstract

The fate of metalorganic molecule ligandsin e-nanoprinting

Dr. Jaroslav Kočišek
Heyrovský Institute of the CAS, Prague, Czechia
Abstract

Reactivity of Low-Energy Electrons and Ions with Molecular Clusters Relevant to Nano-Manufacturing

Dr. Joannis Koepsell
Carl Zeiss SMT GmbH, Rossdorf, Germany
Abstract

Semiconductor mask repair with focused electron-beam induced processing

Dr. Katja Höflich
Ferdinand-Braun-Institut (FBH), Berlin, Germany
Abstract

Electron beam seeding as a new tool for area-selective deposition of gold

Dr. Leo Sala
Heyrovský Institute of the CAS, Prague, Czechia
Abstract

Electron microscopy of DNA nanostructures and their hybrid assemblies

Prof. Lisa McElwee-White
Department of Chemistry, University of Florida, Gainesville, USA
Abstract

Mechanism-Based Design, Synthesis, and Characterization of a Small Molecule Inorganic Photoresist Candidate for EUV Lithography

Prof. Mattia Fanetti
Materials Research Laboratory, University of Nova Gorica, Ajdovščina, Slovenia
Abstract

E-beam local heating with SEM: a new tool fore-beam nanopatterning

Mr. Nicolas P. Jochmann
Goethe University Frankfurt, Germany
Abstract

Precursor development for charged particle deposition:Case studies based on Nb and Ta

Dr. Paul Cannon
Advanced Research Center for Nanolithography (ARCNL), Amsterdam, The Netherlands
Abstract

Optical Measurements of Electric Fields for Electron Microscopy Applications

Dr. Phay J. Ho
Argonne National Laboratory, Lemont, IL, USA
Abstract

Modeling of fundamental mechanisms initiated x-ray irradiation: from atomic to nanometer scales

Prof. Wolfgang S. M. Werner
TU Wien, Institute of Applied Physics, Vienna, Austria
Abstract

Electronic doorway states as efficient secondary electron escape channels in layered graphitic materials

FYRIR SÍMA VIEW

Poster Presentations
Dr. Alessandra Bellissimo
Photonics Institute, TU Wien, Austria, and HUN-REN Wigner Research Centre for Physics, Budapest, Hungary
Abstract

Momentum-Resolved Low-Energy Electron Emission from Crystalline Graphite: From Direct Photoemission to Secondary Cascades and Doorway States

Mr. Alexander Bauer
Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, Austria
Abstract

Non-Contact Mechanical Characterization of FEBID Nanopillars through Resonance Frequency Analysis and Automated Geometry Reconstruction

Prof. Anpan Han
Technical University of Denmark, Kongens Lyngby, Denmark
Abstract

Ice Lithography progress between 2020 and 2026, and perspectives

Mr. Devey Singh Rathore
Delft University of Technology, Delft, The Netherlands
Abstract

In-situ measurement of electron beam-induced surface potentials in a scanning electron microscope

Mr. Dominik Schramm
TU Wien, Vienna Austria
Abstract

Predicting high-aspect-ratio FEBID deposit shapes by incorporating evolving geometry into continuum models

Dr. Ekaterina Shabratova
Ferdinand-Braun-Institut (FBH), Berlin, Germany
Abstract

Printing into Nowhere: Self-Formation of the Transition Region During Localized Electrochemical Copper Deposition onto a Partially Metallized Glass Substrate

Mr. Hans Keur
Delft University of Technology, Delft, The Netherlands
Abstract

Towards the Simulation of Scanning Electron Microscopy Images of Charging Samples

Prof. Harald Plank
Graz University of Technology, Graz, Austria
Abstract1
MC Fusion Probes: 3D-Nanoprinted Co₃Fe Nanoprobes for Simultaneous Magnetic and Conductive AFM
Direct-Write Fabrication of Ultrathin Nb–Based Memristive Devices via FEBID
Abstract2
Functional Imprinting: Post-Growth Programming of Plasmonic Domains in FEBID-based Au-C Matrices
Abstract3

Understanding and Eliminating Sidewall Roughness in 3D Nanoprinting via Focused Ion Beam Induced Deposition

Abstract4
Mr. Jianyao Jin
Imaging Physics, Delft University of Technology, Delft, The Netherlands
Abstract

Model Sensitivity Studies in Low Energy Electron-Matter Interaction Simulations

Dr. Juraj Országh
Comenius University Bratislava, Slovakia
Abstract

Electron induced fluorescence as a tool for detecting neutral fragments

Mr. Michael Schlegel
Institute of Applied Physics, University of Tübingen, Germany
Abstract

Nano-Structuring of 2D Materials using the Scanning Transmission Electron Microscope

Dr. Miloš Ranković
Heyrovsky Institute of the Czech Academy of Sciences, Prague, Czech Republic
Abstract

Electron interactions with liquid micro-jets: Reactivity and Spectroscopy

Mr. Noud van Halteren
Leiden University, Leiden, The Netherlands
Abstract

Low-energy electron exposure of trinuclear tin complex EUV resist

Dr. Pamir Nag
Heyrovsky Institute of the Czech Academy of Sciences, Prague, Czech Republic
Abstract

Gas-phase Fragmentation and Dissociation Dynamics of Novel Iron FEBID Precursors

Prof. Petra Swiderek
University of Bremen, Bremen, Germany
Abstract1
Chemistry of deposit formation in FEBID studied by reflection absorption infrared spectroscopy, desorption experiments and Auger electron spectroscopy

Electron-induced and thermal surface reactions of iron precursors for FEBID

Abstract2
Dr. Rosa Córdoba
Institute of Molecular Science (ICMol), Universitat de València, Spain
Abstract

Helium-Ion-Beam Direct Writing of a 3D Superconducting Nanohelix with Angle-Dependent Magnetotransport

Ms. Rutisha Kotian
Centre of Excellence for Computational Science and Simulation, Somaiya Vidyavihar University, India
Abstract

Reaction Pathway and Mechanistic Insights into Low-Energy Electron-Induced Conversion of Toluene to Acetylene

Mr. Simon Lamprecht
Institute of Electron Microscopy, Graz University of Technology, Austria
Abstract

Multi-Ion FIBID for 3D Direct-Write Nanomanufacturing and Functional Imprinting

Mr. Vasil Yordanov
KU Leuven, Belgium
Abstract

Determining inelastic mean-free path of low-energy (<100eV) electrons in optical and electron photoresists

Prof. Viatcheslav Kokoouline
Laboratoire Kastler Brossel, ENS-Université PSL, Paris, France
Abstract

Theoretical cross sections for rotationally and electronically inelastic and elastic processes in electron-HF scattering

Ms. Wentao Zhang
Ferdinand-Braun-Institut (FBH), Berlin, Germany
Abstract

Unraveling Electron-Induced Dissociation and Molecule-Surface Kinetics for 3D Nano-printing of Photonic Quantum Elements

FYRIR SÍMA VIEW
Dr. Alessandra Bellissimo
Photonics Institute, TU Wien, Austria
Momentum-Resolved Low-Energy Electron Emission from Crystalline Graphite: From Direct Photoemission to Secondary Cascades and Doorway States
Abstract
Mr. Alexander Bauer
Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, Austria
Abstract
Mr. Devey Singh Rathore
Delft University of Technology, Delft, The Netherlands
Abstract
Mr. Dominik Schramm
TU Wien, Vienna Austria
Abstract
Dr. Ekaterina Shabratova
Ferdinand-Braun-Institut (FBH), Berlin, Germany
Abstract
Mr. Hans Keur
Delft University of Technology, Delft, The Netherlands
Abstract
Prof. Harald Plank
Graz University of Technology, Graz, Austria

Abstract1

Abstract2

Abstract3

Abstract4
Mr. Jianyao Jin
Delft University of Technology, fac. Applied Sciences, dept. Imaging Physics, Lorentzweg 1, 2628 CJ Delft, The Netherlands
Abstract
Mr. Michael Schlegel
Institute of Applied Physics, University of Tübingen, Germany
Abstract
Dr. Miloš Ranković
Heyrovsky Institute of the Czech Academy of Sciences, Prague, Czech Republic
Abstract
Mr. Noud van Halteren
Leiden University, Niels Bohrweg 2, 2333 CA Leiden, The Netherlands
Abstract
Dr. Pamir Nag
Heyrovsky Institute of the Czech Academy of Sciences, Prague, Czech Republic
Abstract
Prof. Petra Swiderek
University of Bremen, Leobener Str. 5, 28359 Bremen, Germany

Abstract1

Abstract2
Dr. Rosa Córdoba
Institute of Molecular Science (ICMol), Universitat de València, Spain
Abstract
Ms. Rutisha Kotian
Centre of Excellence for Computational Science and Simulation, Somaiya Vidyavihar University, India
Abstract
Mr. Simon Lamprecht
Institute of Electron Microscopy, Graz University of Technology,Austria
Abstract
Mr. Vasil Yordanov
KU Leuven, Belgium
Abstract
Mr. Wentao Zhang
Ferdinand-Braun-Institut (FBH), Gustav-Kirchhoff-Str. 4, 12489, Berlin, Germany
Abstract

HÉR FYRIR NEÐAN ER UPPSETNING FYRIR CONTRIBUTED TALKS (20STK) EINS OG ER SETT UPP FYRIR KEYNOTE OG INVITED TALKS – MIÐJUDÁLKURINN FYRIR HVERT UNIT ER FYRIR MOBILE VIEW – MUNA AÐ LAGA FYRIR MOBILE VIEW

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Prof. Howard Fairbrother

Johns Hopkins University, Baltimore, Maryland, USA

Title: Role of Low-Energy Electrons in All-Dry Processing Strategies for Semiconductor Technologies

Abstract

Dr. John S. Villaburria

John Villarrubia is a physicist and leader of the Electron-Solid Interactions project in the Physical Measurement Laboratory (PML) at the National Institute of Standards and Technology (NIST). At NIST, he contributed to the Molecular Measuring Machine project, applied mathematical morphological methods to the tip-sample interaction in an STM or AFM to invent the first blind reconstruction method for the determination of tip geometry, and developed JMONSEL, a Monte Carlo simulator that uses a suite of physics models for electron-solid interactions to simulate secondary electron image formation for 3-dimensional samples of arbitrary shape. He is a fellow of the Washington Academy of Sciences, recipient of three SPIE Nyyssonen Metrology best paper awards, a Nanotech Briefs Nano50 Technology Award, and U.S. Department of Commerce Silver and Gold medals.

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Prof. Stacey Bent

Stacey F. Bent is Jagdeep and Roshni Singh Professor at Stanford University, where she is Professor of Chemical Engineering and of Energy Science and Engineering, and Professor by courtesy of Chemistry, Materials Science and Engineering, and Electrical Engineering. Her research focuses on understanding surface chemistry, materials synthesis, and atomic layer deposition, and applying this knowledge to problems in sustainable energy, microelectronics, and advanced manufacturing. Bent has published over 340 peer-reviewed papers, holds 7 patents, and has presented nearly 400 invited talks. She has supervised 60 Ph.D. students and 35 postdoctoral scholars. Bent was elected to the U.S. National Academy of Engineering in 2020. She is also a Fellow of the American Chemical Society (ACS) and the American Vacuum Society (AVS) and has received various awards for her contributions to surface chemistry, materials engineering and ALD innovation.

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Prof. Dr. Timon Fliervoet

Timon Fliervoet is a full professor in SEM system design at Delft University of Technology. His research focuses on building a fundamental understanding of electron microscopy, imaging physics, and electron beam system behavior, while translating these insights into industrial applications and future semiconductor technologies.
At ASML, he works as a system architect and electron beam researcher, contributing to advanced electron beam systems for semiconductor metrology and inspection. His work brings together system design, cross-disciplinary innovation, and long-term technology development for next-generation semiconductor manufacturing.
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Dr. Sven Christian Barth

Dr. Sven Barth received his Ph.D. in Chemistry from Saarland University in 2008 and completed his habilitation at TU Wien in 2015. He is currently a research group leader and Managing Director of the Goethe Centre for (High) Technology (Go4Tec) at Goethe University Frankfurt and is a former DFG Heisenberg Fellow.

His research focuses on the molecule-based synthesis of functional nanomaterials, with a particular emphasis on direct-write nanoprinting using focused electron- and ion-beam-induced deposition (FEBID/FIBID). His work explores the controlled fabrication of nanoarchitectures and functional nanoscale devices, linking precursor design with deposition processes and resulting material properties. He has co-authored more than 100 scientific publications.

In addition to his research activities, he is engaged in the strategic development and sustainable management of cross-disciplinary high-technology research infrastructures at Goethe University Frankfurt through Go4Tec.

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Dr. Jakub Mateusz Jurczyk

Jakub Jurczyk received his PhD degree in Physics from AGH University of Cracow. His PhD project was realised together with Empa – Swiss Federal Laboratories for Materials Sciences and Technology in Thun (group of dr. Ivo Utke), as a part of ELENA International Training Network and was focused on investigation of novel precursors for focused electron beam induced deposition (FEBID) and on the properties of nanostructures deposited with them. Within the scope of the ITN, dr. Jurczyk investigated organometallic complexes of various metals, especially silver, ruthenium and gold, as potential FEBID precursors. His work included deposition of high-metal-content structures using new precursors, development of the methods of characterisation of their properties, such as FEBiMS, (mass spectrometry during FEBID) and modelling of FEBID process, by expanding FEBID continuum model to include co-deposition of ligands.  After graduation, dr. Jurczyk joined the group of prof. Amalio Fernández-Pacheco in Instituto de Nanociencia y Materiales de Aragón (INMA), where he was investigating the three-dimensional magnetic nanostructures for potential spintronic applications.

Currently dr. Jurczyk works as the University Assistant in the Institute of Applied Physics in Vienna University of Technology (TU Wien), where he continues his research of magnetic nanostructures with prof. Amalio Fernandez-Pacheco.  He is responsible for fabrication of functional, complex-shape 3D nanostructures using methods of 3D nano- and micro-printing such as FEBID and two-photon lithography, combined with physical vapour deposition. He also works on characterization of deposited structures with methods based on visible light, like dark field magnetooptical Kerr effect or on synchrotron radiation, such as photoelectron emission microscopy (PEEM) or scanning transmission X-ray microscopy (STXM).

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Dr. Eliška Mikmeková

Eliška Materna Mikmeková, Ph.D., MBA is Group Leader of the Microscopy and Spectroscopy of Surfaces group at the Institute of Scientific Instruments of the Czech Academy of Sciences in Brno. She specializes in low and ultra-low energy scanning (transmission) electron microscopy (LV S(T)EM) and low-energy electron–matter interactions at surfaces and in two-dimensional materials. Her research combines advanced imaging modes, beam deceleration techniques, and quantitative STEM-in-SEM with spectroscopic methods (XPS, Raman, FTIR) and thin-film deposition (CVD, PECVD, magnetron sputtering) to elucidate structural and electronic properties at the nanoscale.

She previously worked as a Marie Curie Experienced Researcher in the SIMDALEE2 project at Thermo Fisher Scientific, contributing to instrumentation development and in-situ surface treatment methods. In 2021, she was awarded a Fulbright Scholarship at Rutgers University. She leads nationally funded projects on novel contrast mechanisms and quantitative electron microscopy for nanomaterials and advanced nanofabrication.

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Prof. Philip D. Racks

Professor Rack earned his bachelor’s degree Materials Science and Engineering from the Georgia Institute of Technology in 1993, and his Ph.D. in Materials Science and Engineering from the University of Florida in 1997.  He then joined Advanced Vision Technologies Inc. (AVT) as a Senior Research Scientist where he led their research on luminescent and field emission materials.  In 1999, he joined the faculty in the Microelectronic Engineering Department at the Rochester Institute of Technology and in 2001 he joined the faculty in the Materials Science and Engineering Department at University of Tennessee.  He was a joint staff member at the Center for Nanophase Materials Sciences at the Oak Ridge National Laboratory from 2005-2021.  His research broadly studies emergent properties of nanoscale materials and devices which currently has four focus areas: 1) combinatorial thin film processing for rapid materials discovery, 2) compositional complex oxide and 2D material nanoscale devices, 3) nanoscale focused electron, and focused ion and photon beam induced processing.  Dr Rack has authored or co-authored over 300 refereed journal articles, has over 16,00 citations and  has a Google Scholar H-index of 67. 

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Prof. Sense Jan van der Molen

Sense Jan van der Molen is a full professor of physics at Leiden University. His background is in condensed matter physics, specifically metal-insulator transitions, and molecular electronics. In more recent years, he specialized in van der Waals materials, probing these layered systems with low-energy electron microscopy (LEEM) and related techniques, some of which were developed in his lab (eV-TEM, LEEP, ARRES and recently ONEM). His group’s LEEM research on thin organic layers brought a connection to the EUV community, resulting in new research projects and his involvement in the LEELIS conference series. Currently, Van der Molen is the scientific director of the Leiden Institute of Physics.

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Prof. Bo Da

Prof. Da Bo received his B.S. and Ph.D. degrees in Physics from the University of Science and Technology of China (USTC) in 2008 and 2013. He is currently a Professor at Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China (USTC), after his time as Senior Researcher and Principal Investigator at the National Institute for Materials Science (NIMS), Japan.

His research focuses on electron optics, electron–matter interactions, and electron beam technologies. He has published more than 160 peer-reviewed articles.

He received the NIMS President Award, as well as the 54th Kurata Scholarship from the Hitachi Foundation, the Kao Science Award from the Kao Foundation, and a Single-Year Research Grant from the Ikenati Foundation. He also proposed the official NIMS slogan, “Materials change the world, we create materials.”

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Prof. Howard Fairbrother

Howard Fairbrother is a Professor and Associate Chair of the Chemistry Department at Johns Hopkins University. He received his B.A. in Chemistry from the University of Oxford, England, and his Ph.D. in Chemistry from Northwestern University. He joined the Department of Chemistry at Johns Hopkins in 1997 following postdoctoral research at the University of California, Berkeley. He served as a senior editor for the Journal of Physical Chemistry from 2013-2023.

His materials research centers on understanding how chemical interactions at surfaces and interfaces control the properties, transformation, and performance of nanoscale and functional materials. His work combines surface chemistry, electron–surface interactions, and advanced spectroscopic and analytical methods to elucidate chemical processes occurring at material interfaces. More recently he has become interested in the development of dry processes for semiconductor technologies.

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