ELISA 2026 explores the full spectrum of electron–matter interaction, from the mechanisms that govern secondary electron production, energy transfer, chemistry, and material response, to the technologies that harness these effects for imaging, patterning, and nanofabrication.

The meeting connects fundamental studies on electron generation through high energy photons, as is the case in EUV- and X-ray lithography, as well as through high-energy electron and ion beams as is the case in BEACON, with electron transport, electron scattering and electron induced chemistry. It further connects these fundamentals of physics and chemistry with advances in beam- and light-based lithography, nanofabrication, spectroscopy, and high-resolution microscopy. Hence, covering electron-matter interaction induced by ionizing radiation equally in EUVL and beam lithography.

Beyond the fundamental understanding, ELISA highlights how electron and ion beams enable direct-write, site-specific manufacturing of functional structures – from the lowest nanoscale to fully functional 3D architectures and how photons enable the patterning and imaging in thin photosensitive films through low energy electron generation and their interaction with matter.

By linking expertise in modelling, metrology, experiments, and instrumentation, the event combines the know-how needed to shape the next generation of lithography, imaging, and beam-induced nanomanufacturing across science and industry.