Electrons in Lithography and Imaging for
Science and Application

 

Welcome reception 4 August 2026

Full conference days 5-7 August 2026

Reykjavik, Iceland

Scientific Scope

ELISA 2026 spans the full landscape of electron-based science and technology, from the fundamental processes that govern electron–matter interaction to the instruments and applications that translate this understanding into imaging, patterning, and nanomanufacturing.

Rapid advances in beam technologies, resist materials & precursors, and data- / feedback-driven control are redefining how we understand and exploit electron-matter interactions. By merging the traditions of LE2AP, LEELIS and FEBIP, the meeting creates a unified space where modelling, metrology, experiments, and instrumentation converge – bridging physics and fabrication, materials and devices, and concepts and implementation. This perspective maintains the LE2AP+LEELIS initiative while including multi-material, hybrid 3D nanostructures central to the Beam Induced Nano-Manufacturing community.

The meeting fosters dialogue between foundation science and applications, strengthens bridges across core disciplines, and promotes shared terminology, metrology and benchmarking. It encourages collaboration among academia, industry, and instrument developers, offers visibility and networking.

Importantly it offers continuity as an excellent platform for early-career researchers and students for interaction with established academic research groups and industry, and helps shape a collective vision for next-generation electron-based science and technology.

 

 

 

 

 

Thematic Pillars

The topics below are representative rather than exhaustive. Related or emerging concepts in electron-based science, lithography, imaging, and nanomanufacturing are equally welcome.

  1. Fundamentals of Electron–Matter Interaction
  • Generation of electrons in photon-, electron-, ion-, or atom-beam environments
  • Transport, absorption, scattering, and energy dissipation in solids and soft matter and charging in insulating materials
  • Low-energy electron induced chemistry in molecular precursors and resist materials
  • Theory, modelling and simulation of electron-induced processes.
 
  1. Methods & Instrumentation
  • Extreme Ultraviolet and X-ray lithography.
  • Electron-, ion- and atom-beam lithography.
  • Advanced light and beam sources, and detector systems.
  • Low-voltage and high-resolution electron microscopy (e.g. LEEM, SEM, STEM, CDSEM).
  • Cryo-based platforms for soft and hybrid materials.
  • Metrology, tools, methods and measures.
  • Correlative spectroscopy (e.g. photoemission, IR, RGA, MS, tomography)
  • Hybrid approaches combining electrons, ions, and photons for multimodal analysis.
 
  1. Applications & Nanomanufacturing
  • Electron, ion, and photon lithography (e.g. EUVL, EBL, FIBID, FEBID, FEBIE, FIBIE X-ray, ion/atom beam)
  • Patterning on photosensitive thin film materials, e.g. resist research and development at academic and industrial level.
  • Direct-write, site-specific, additive nanomanufacturing from 0D to fully 3D architectures including multi-material systems
  • Localized property engineering and irradiation-induced modification of materials
  • Functional nanostructures for electronics, superconductivity, magnetism, quantum technologies, optics, actuators, and sensing
  • Correlative imaging and multimodal analysis of fabricated structures
  • Localized repair strategies and integration of beam-based fabrication into industrial and scientific environments
 
 
 

Contributions to ELISA 2026 are not limited to these areas and all relevant contributions are welcomed and will be considered.