Electrons in Lithography and Imaging for
Science and Application

 

Welcome reception 4 August 2026

Full conference days 5-7 August 2026

Reykjavik, Iceland

The host of ELISA 2026 is the Science Institute of the University of Iceland

Scientific Committee

Oddur Ingólfsson | chair

Alessandra Bellissimo

Danilo De Simone

Roberto Fallica

Kees Hagen

Jacob Hoogenboom

Hubertus Marbach Carl Zeiss

Harald Plank

Petra Swiderek

University of Iceland, IS

TU Wien, AU

imec, BE

imec, BE

TU Delft, NL

TU Delft, NL

AG, DE

TU Gratz-FELMI, AU

University of Bremen, DE

Scientific Committee

Oddur Ingólfsson | chair

Alessandra Bellissimo

Danilo De Simone

Roberto Fallica

Kees Hagen

Jacob Hoogenboom

Hubertus Marbach Carl Zeiss

Harald Plank

Petra Swiderek

University of Iceland, IS

TU Wien, AU

imec, BE

imec, BE

TU Delft, NL

TU Delft, NL

AG, DE

TU Gratz-FELMI, AU

University of Bremen, DE

Scientific Committee

Oddur Ingólfsson | chair

Alessandra Bellissimo

Danilo De Simone

Roberto Fallica

Kees Hagen

Jacob Hoogenboom

Hubertus Marbach Carl Zeiss

Harald Plank

Petra Swiderek

University of Iceland, IS

TU Wien, AU

imec, BE

imec, BE

TU Delft, NL

TU Delft, NL

AG, DE

TU Gratz-FELMI, AU

University of Bremen, DE

Local Organizing Committee

Oddur Ingólfsson

Sigríður Karlsdóttir

Ingibjörg Ólafsdóttir

University of Iceland

University of Iceland

University of Iceland

Contact

Should you have any questions about the ELISA 2026, please do not hesitate to contact us at: elisa2026@hi.is

Do you have questions about your abstract?
Please contact us at: elisa2026.abstract@hi.is

Address

Háskólatorg, University of Iceland, Sæmundargata 2, 102 Reykjavík, Iceland

Email

hi@hi.is

Phone no

+354 525 4000

ELISA | Electrons in Lithography and Imaging for Science and Application

© Allur réttur áskilinn

Oddur
Ingólfsson

Oddur Ingólfsson is full professor at the University of Iceland. His area of research is electron molecule interaction, focusing on the reactive processes of dissociative ionization and dissociative electron attachment. He co-authored over 100 papers in peer-reviewed journals, edited and co-authored a book on electron molecule interaction, and is co-inventor on 6 patents. Prof. Ingólfsson was the coordinator of the Horizon 2020; Marie Sklodowska-Curie Innovative Training Network ELENA -Low energy ELEctron driven chemistry for the advantage of emerging NAno- fabrication methods, and chair of the EU-COST Action CM0601 – Electron Controlled Chemical Lithography (ECCL). He has served on the scientific committee and hosted for several conferences on electron molecule interactions and related topics.

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Danilo
De Simone

Danilo De Simone is scientific director at imec. He has 24 years of experience in the semiconductor R&D field and his work has produced over 100 scientific and technical papers in the field of lithographic materials and advanced patterning. Before imec, he worked for the industry for STMicroelectronics, Numonyx and Micron Technology. He is editorial board member of the Journal of Micro/Nanopatterning, Materials, and Metrology (JM3), member of SPIE committee for the Patterning Materials and Processes program and member of the International Advisory Board of the Photopolymer Science and Technology Conference (ICPST).

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Roberto
Fallica

Roberto Fallica received his master’s degree in Electronics Engineering from Politecnico di Milano (Italy) in 2007 and completed the PhD school in Nanotechnology from University of Milano-Bicocca in 2012 with a thesis on the characterization of phase-change chalcogenide nanowires for nonvolatile data storage. In 2014 he was postdoc researcher at the Paul Scherrer Institute (Switzerland) working at the dedicated EUV/X-ray interference lithography and X-ray absorption spectroscopy beamline for characterization and patterning of nanoscale photoresist structures. Since 2018, he is staff researcher in the Advanced Patterning department of IMEC (Belgium). His duties include the screening of lithography materials and stacks to develop the technology that will enable future semiconductor devices in BEOL (back-end of line) such as DRAM (storage layer) and logic (metalization). For this purpose he is focusing on characterization of EUV litho stack materials (photoresist and underlayers) especially for defect mitigation by improving adhesion. In addition, he is in charge of measuring fundamental physical properties of EUV photoresists such as electron blur and electronic processes by photoemission spectroscopy and photocurrent. He is member of SPIE since 2016.

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Kees
Hagen

Kees Hagen is associate professor at Delft University of Technology. His area of research is microscopy and lithography with charged particles. He co-authored over 120 papers in peer-reviewed journals, a book on electron-beam-induced nanometer-scale deposition, and 2 patents. In 2006 he organized the first International Workshop on Focused Electron-Beam-Induced Deposition Processing (FEBIP) in Delft, served as chairman of the International Steering Committee of the FEBIP workshops till 2022, was co-chair of the EU-COST Action CM1301 CELINA, conference chair of the 41st International Micro and Nano Engineering conference MNE2015 in the Hague, and is board member of the International Micro and Nano Engineering Society iMNEs.

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Jacob
Hoogenboom

Jacob Hoogenboom is associate professor and group leader at the Imaging Physics department of Delft University of Technology (NL) and visiting professor at the University of Lausanne (CH). His research focuses on the development and implementation of novel microscopy techniques based on the integration of light and electron microscopy in a single instrument. The interest of his research group is in particular in techniques for life sciences and biomedical applications aimed at multi-scale and correlative imaging and in experimental techniques to better understand charging and damage under electron beam irradiation.

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